PTFE Surface Etching in the Post-Discharge of a Scanning RF Plasma Torch: Evidence of Ejected Fluorinated Species

Dufour, T.; Hubert, J.; Viville, Pascal; Duluard, C.Y.; Desbief, Simon; Lazzaroni, Roberto; Reniers, F.

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PTFE Surface Etching in the Post-Discharge of a Scanning RF Plasma Torch: Evidence of Ejected Fluorinated Species

Dufour, T.; Hubert, J.; Viville, Pascal et al.

2012 • In Plasma Processes and Polymers, 9, p. 820-829

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Disciplines :

Physics

Author, co-author :

Dufour, T.

Hubert, J.

Viville, Pascal ; Université de Mons > Unités externes > Materia Nova ASBL

Duluard, C.Y.

Desbief, Simon ; Université de Mons > Faculté des Sciences > Chimie des matériaux nouveaux

Lazzaroni, Roberto ; Université de Mons > Faculté des Sciences > Service de Chimie des matériaux nouveaux

Reniers, F.

Language :

English

Title :

PTFE Surface Etching in the Post-Discharge of a Scanning RF Plasma Torch: Evidence of Ejected Fluorinated Species

Publication date :

01 January 2012

Journal title :

Plasma Processes and Polymers

ISSN :

1612-8850

Publisher :

Wiley - VCH Verlag GmbH & Co., Germany

Volume :

Pages :

820-829

Peer reviewed :

Peer Reviewed verified by ORBi

Research unit :

S817 - Chimie des matériaux nouveaux

Research institute :

R400 - Institut de Recherche en Science et Ingénierie des Matériaux

Available on ORBi UMONS :

since 12 November 2012

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Bibliography

N. Vandencasteele, B. Nisol, P. Viville, R. Lazzaroni, D. G. Castner, F. Reniers, Plasma Process. Polym. 2008, 5, 661.
I. P. Parkin, R. G. Palgrave, J. Mater. Chem. 2005, 15, 1689.
H. Dodiuk, P. F. Rios, A. Dotan, S. Kenig, Polym. Adv. Technol. 2007, 18, 746.
Patent US 2010/0326495 A1, Self-cleaning protective coatings for use with photovoltaic cells, C. M. Gronet, J. K. Truman.
E. Sakai, J. Sugita, Cem. Concr. Res. 1995, 25, 127.
N. Vandencasteele, F. Reniers, Surf. Interface Anal. 2004, 36, 1027.
M. Morra, E. Occhiello, F. Garbassi, Langmuir 1989, 5, 872.
N. Marechal, Y. Pauleau, J. Vac. Sci. Technol. A 1992, 10, 477.
H. Biederman, M. Zeuner, J. Zalman, P. Bilkova, D. Slavinska, V. Stelmasuk, A. Boldyreva, Thin Solid Films 2001, 392, 208.
J. P. Youngblood, T. J. McCarthy, Macromolecules 1999, 32, 6800.
H. Biederman, Vacuum 2000, 59, 594.
Z. Fang, Y. Qiu, Y. Luo, J. Phys. D: Appl. Phys. 2003, 36, 2980.
N. Vandencasteele, H. Fairbrother, F. Reniers, Plasma Process. Polym. 2005, 2, 493.
N. Vandencasteele, B. Broze, S. Collette, C. De Vos, P. Viville, R. Lazzaroni, F. Reniers, Langmuir 2010, 6, 63.
J. H. Noh, H. K. Baik, I. Noh, J.-C. Park, I.-S. Lee, Surf. Coat. Technol. 2007, 201, 5097.
N. Zettsu, H. Itoh, K. Yamamura, Thin Solid Films 2008, 516, 6683.
C. Z. Liu, J. Q. Wu, L. Q. Ren, J. Tong, J. Q. Li, N. Cui, N. M. D. Brown, B. J. Meenan, Mater. Chem. Phys. 2004, 85, 340.
K. Tanaka, M. Kogoma, Int. J. Adhes. Adhes. 2003, 23, 515.
E. Carbone, N. Boucher, M. Sferrazza, F. Reniers, Surf. Interface Anal. 2010, 42, 1014.
Patent US7329608 Surfx Technologies, Method of processing a substrate, Steven E. Babayan, Robert F. Hicks, 2008.
M. Strobel, C. S. Lyons, Plasma Process. Polym. 2011, 8, 8.
R. D. Mundo, F. Palumbo, Plasma Process. Polym. 2011, 8, 8.
D. Briggs, M. P. Seah, Practical Surface Analysis, Auger and X-ray Photoelectron Spectroscopy, 2nd edition, Wiley, New York 1990.
M. Collaud Coen, G. Dietler, S. Kasas, P. Gröning, Appl. Surf. Sci. 1996, 103, 27.
F. Dubourg, S. Kopp-Marsaudon, P. Leclère, R. Lazzaroni, J. P. Aimé, Eur. Phys. J. E 2001, 6, 387.
R. J. Lagow, US Patent 4076916 (1978).
R. Di Mundo, F. Palumbo, R. d'Agostino, Langmuir 2008, 24, 5044.
S. Trigwell, D. Boucher, C. I. Calle, J. Electrostat. 2007, 65, 401.