Spectroscopic investigations of YAG-laser-driven microdroplet-tin plasma 
sources of extreme ultraviolet radiation for nanolithography

Versolato, O.; Bayerle, A.; Bayraktar, M.; Behnke, L.; Bekker, H.; Bouza, Z.; Colgan, J.; Crespo López Urrutia, J. R.; Deuzeman, M. J.; Hoekstra, R.; Kurilovich, D.; Liu, B.; Meijer, R.; Neukirch, A.; Poirier, L.; Rai, S.; Ryabtsev, A.; Scheers, J.; Schupp, R.; Sheil, J.; Torretti, F.; Ubachs, W.; Witte, S.

doi:10.1088/1742-6596/1412/19/192006

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Spectroscopic investigations of YAG-laser-driven microdroplet-tin plasma sources of extreme ultraviolet radiation for nanolithography

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Bekker, H.
Division Prof. Dr. Thomas Pfeifer, MPI for Nuclear Physics, Max Planck Society;

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Crespo López Urrutia, J. R.
Division Prof. Dr. Thomas Pfeifer, MPI for Nuclear Physics, Max Planck Society;

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Versolato, O., Bayerle, A., Bayraktar, M., Behnke, L., Bekker, H., Bouza, Z., et al. (2020). Spectroscopic investigations of YAG-laser-driven microdroplet-tin plasma sources of extreme ultraviolet radiation for nanolithography. Journal of Physics: Conference Series, 1412: 192006. doi:10.1088/1742-6596/1412/19/192006.

Cite as: https://hdl.handle.net/21.11116/0000-0008-1982-9

Abstract

Highly charged tin ions are the sources of extreme ultraviolet (EUV) light at 13.5-nm wavelength in laser-produced transient plasmas for next-generation nanolithography. Generating this EUV light at the required power, reliability, and stability however presents a formidable task that combines industrial innovations with challenging scientific questions. We will present work on the spectroscopy of tin ions in and out of YAG-laser-driven plasma and present a surprising answer to the key question: what makes that light?