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Investigation of selective oxidation during cooling of hot-rolled iron-manganese-silicon alloys

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Zhang,  Xue
Corrosion, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;
Corrosion Center, Institute of Metal Research, Chinese Academy of Sciences, Shenyang 110016, China;

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Corrêa da Silva,  Cauê
Corrosion, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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Zhang,  Siyuan
Nanoanalytics and Interfaces, Independent Max Planck Research Groups, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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Prabhakar,  J. Manoj
Corrosion, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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Lu,  Wenjun
Advanced Transmission Electron Microscopy, Structure and Nano-/ Micromechanics of Materials, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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Vogel,  Alexandra
Corrosion, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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Rohwerder,  Michael
Corrosion, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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Citation

Zhang, X., Corrêa da Silva, C., Zhang, S., Prabhakar, J. M., Lu, W., Vogel, A., et al. (2021). Investigation of selective oxidation during cooling of hot-rolled iron-manganese-silicon alloys. Corrosion Science, 186: 109466. doi:10.1016/j.corsci.2021.109466.


Cite as: https://hdl.handle.net/21.11116/0000-0008-AAFC-D
Abstract
The kinetics of selective oxidation in iron-manganese-silicon alloys of varying silicon contents was examined at 700°C and oxygen partial pressure of 2.9×10−22 bar for up to 2 h. The investigation revealed a linear mass gain over time, suggesting oxygen uptake as the rate-controlling step of reaction. Internal oxidation depth particularly along grain boundaries increased considerably with increasing silicon content. Differences in microstructure and near-surface chemistry of the alloys as a function of the silicon content are discoursed on. The results point to the crucial role of a thin oxide layer, a solid solution between FeO and MnO, in the oxidation process. © 2021 The Authors