Adsorption, thermal and photochemical reactions of NO on clean and oxygen 
precovered Ni(100) surfaces

Kuhlenbeck, H.; Odörfer, G.; Jaeger, R.; Xu, C.; Mull, T.; Baumeister, B.; Illing, G.; Menges, M.; Freund, Hans-Joachim; Weide, D.; Andresen, P.; Watson, G.; Plummer, E.W.

doi:10.1016/0042-207X(90)90263-X

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Adsorption, thermal and photochemical reactions of NO on clean and oxygen precovered Ni(100) surfaces

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Kuhlenbeck, H., Odörfer, G., Jaeger, R., Xu, C., Mull, T., Baumeister, B., et al. (1990). Adsorption, thermal and photochemical reactions of NO on clean and oxygen precovered Ni(100) surfaces. Vacuum, 41(1-3), 34-36. doi:10.1016/0042-207X(90)90263-X.

Cite as: https://hdl.handle.net/21.11116/0000-000E-7161-5

Abstract

We have studied the adsorption, thermal and photochemical reactions of NO adsorbed on clean Ni(100), epitaxially grown NiO, and Ni(100) precovered with chemisorbed oxygen. The electronic and geometric structure of the substrate surfaces and the adsorbed NO molecules were investigated by electron spectroscopic techniques, i.e. HREELS, NEXAFS and LEED, whereas the thermal and photochemical properties of the adsorbate layer were probed using TPD and laser induced desorption, respectively.