Low temperature doped and undoped expitaxial Si and Si1-xGex growth

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Date

1995-05

Authors

Li, Chi-nan Brian

Journal Title

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Abstract

Department

Electrical and Computer Engineering

Description

Keywords

LCSH Subject Headings

Semiconductor doping, Silicon, Epitaxy, Thin films, Plasma-enhanced chemical vapor deposition

Citation

URI

https://hdl.handle.net/2152/74392
 http://dx.doi.org/10.26153/tsw/1512

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