Export Mendeley
＜Book＞
Diffusion mechanism of nickel and point defects in silicon (Japanese journal of applied physocs, vol.21 no.2)
| Responsibility | Masayuki Yoshida |
|---|---|
| Material Type | Book |
| Publisher | Tokyo |
| Language | English |
Holdings
| Status | Volume | Location | Call No. | Printed | Collection Name | Barcode No. | Comments | Reserve | Copy | Automatic archive |
|---|---|---|---|---|---|---|---|---|---|---|
|
|
DESIGN LIB., 3F | Books Written by Faculty | AAA611/ヨシダマ/23 | 1982 |
|
072031281015782 |
|
Bibliographic details
| Authors | 吉田, 正幸 <ヨシダ、 マサユキ> |
|---|---|
| ID | 1000005229 |
| NCID | LB21866082 |
| Created Date | 1995.03.01 |
| Modified Date | 2005.10.03 |