The fabrication of stable platinum-silicon oxide multilayers for X-ray mirrors

Solina, DM; Cheary, RW; Swift, PD; McCredie, G

The fabrication of stable platinum-silicon oxide multilayers for X-ray mirrors

Solina, DM

Cheary, RW Swift, PD McCredie, G

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Publication Type:: Journal Article
Citation:: Thin Solid Films, 2003, 423 (1), pp. 1 - 12
Issue Date:: 2003-01-01

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Field	Value	Language
dc.contributor.author	Solina, DM https://orcid.org/0000-0003-1810-0096	en_US
dc.contributor.author	Cheary, RW	en_US
dc.contributor.author	Swift, PD	en_US
dc.contributor.author	McCredie, G	en_US
dc.date.issued	2003-01-01	en_US
dc.identifier.citation	Thin Solid Films, 2003, 423 (1), pp. 1 - 12	en_US
dc.identifier.issn	0040-6090	en_US
dc.identifier.uri	http://hdl.handle.net/10453/401
dc.description.abstract	An investigation has been carried out to determine the conditions required for the fabrication of stable SiO2-Pt multilayers using DC-magnetron sputtering for the Pt and RF-magnetron sputtering for the SiO2. As a preliminary investigation, single layers of Pt on SiO2 were analysed by X-ray reflectivity (XRR) and X-ray photoelectron spectroscopy (XPS) to develop a model of the Pt-SiO2 interface layer. The results indicated that a distinct interface layer develops as a Pt silicate approximately 6 Å thick. SiO2-Pt multilayers fabricated with a period d>65 Å using pure argon as the sputtering gas, display X-ray reflectivity patterns which can be accurately characterised by a repeating bilayer model. When d<65 Å the multilayer becomes unstable upon exposure to air. Additional peaks develop in the XRR pattern which increase in magnitude with time. These peaks arise from the expansion of the SiO2 layers in the multilayer starting from the top bilayer and gradually working through the multilayer. In the as-prepared specimens the SiO2 layers are incompletely oxidised and have a composition SiOx (x<2) and, on exposure to air, oxygen diffuses through the multilayer surface converting the SiOx to SiO2. By introducing a small partial pressure of oxygen into the sputtering gas during deposition, multilayers with d<65 Å remained stable on exposure to air. Under these conditions the density of the platinum layers determined from XRR measurements was reduced by approximately 25%. XPS showed that the platinum layer contained bonded oxygen in the form of platinum oxide PtOx (x<1). SiO2/PtOx multilayers have been fabricated with periods down to 13 Å, but the intensity of the first order peak drops off dramatically once the thickness of the PtOx layer is less that 10-12 Å. © 2002 Elsevier Science B.V. All rights reserved.	en_US
dc.relation.ispartof	Thin Solid Films	en_US
dc.relation.isbasedon	10.1016/S0040-6090(02)00360-7	en_US
dc.subject.classification	Applied Physics	en_US
dc.title	The fabrication of stable platinum-silicon oxide multilayers for X-ray mirrors	en_US
dc.type	Journal Article
utslib.citation.volume	1	en_US
utslib.citation.volume	423	en_US
utslib.for	0204 Condensed Matter Physics	en_US
utslib.for	02 Physical Sciences	en_US
utslib.for	09 Engineering	en_US
utslib.for	10 Technology	en_US
pubs.embargo.period	Not known	en_US
pubs.organisational-group	/University of Technology Sydney
pubs.organisational-group	/University of Technology Sydney/Faculty of Science
pubs.organisational-group	/University of Technology Sydney/Faculty of Science/School of Mathematical and Physical Sciences
utslib.copyright.status	closed_access
pubs.issue	1	en_US
pubs.publication-status	Published	en_US
pubs.volume	423	en_US

Abstract:

An investigation has been carried out to determine the conditions required for the fabrication of stable SiO2-Pt multilayers using DC-magnetron sputtering for the Pt and RF-magnetron sputtering for the SiO2. As a preliminary investigation, single layers of Pt on SiO2 were analysed by X-ray reflectivity (XRR) and X-ray photoelectron spectroscopy (XPS) to develop a model of the Pt-SiO2 interface layer. The results indicated that a distinct interface layer develops as a Pt silicate approximately 6 Å thick. SiO2-Pt multilayers fabricated with a period d>65 Å using pure argon as the sputtering gas, display X-ray reflectivity patterns which can be accurately characterised by a repeating bilayer model. When d<65 Å the multilayer becomes unstable upon exposure to air. Additional peaks develop in the XRR pattern which increase in magnitude with time. These peaks arise from the expansion of the SiO2 layers in the multilayer starting from the top bilayer and gradually working through the multilayer. In the as-prepared specimens the SiO2 layers are incompletely oxidised and have a composition SiOx (x<2) and, on exposure to air, oxygen diffuses through the multilayer surface converting the SiOx to SiO2. By introducing a small partial pressure of oxygen into the sputtering gas during deposition, multilayers with d<65 Å remained stable on exposure to air. Under these conditions the density of the platinum layers determined from XRR measurements was reduced by approximately 25%. XPS showed that the platinum layer contained bonded oxygen in the form of platinum oxide PtOx (x<1). SiO2/PtOx multilayers have been fabricated with periods down to 13 Å, but the intensity of the first order peak drops off dramatically once the thickness of the PtOx layer is less that 10-12 Å. © 2002 Elsevier Science B.V. All rights reserved.

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