| 標題: | PREPARATION AND CHARACTERIZATION OF SOME TIN OXIDE-FILMS |
| 作者: | UEN, TM HUANG, KF CHEN, MS GOU, YS 電子物理學系 光電工程學系 Department of Electrophysics Department of Photonics |
| 公開日期: | 1-三月-1988 |
| URI: | http://hdl.handle.net/11536/4548 |
| ISSN: | 0040-6090 |
| 期刊: | THIN SOLID FILMS |
| Volume: | 158 |
| Issue: | 1 |
| 起始頁: | 69 |
| 結束頁: | 80 |
| 顯示於類別： | 期刊論文 |
- Heteroepitaxial growth of TiN film on MgO (100) by reactive magnetron sputtering / Chen, Wei-Chun;Peng, Chun-Yen;Chang, Li
- Temperature dependence of Fluorine-doped tin oxide films produced by ultrasonic spray pyrolysis / Lin, Chin-Ching;Chiang, Mei-Ching;Chen, Yu-Wei
- 整合液相沈積二氧化錫薄膜與微機電結構之氣體感測器的設計、實現與量測 / 黃彥期;Huang, Yen-Chi;邱俊誠;Chiou, Jin-Chern
- Growth and characterization of diamond films on TiN/Si(100) by microwave plasma chemical vapor deposition / Chen, Wei-Chun;Wang, Wei-Lin;Tiwari, Rajanish N.;Chang, Li
- Wafer bonding for high-brightness light-emitting diodes via indium tin oxide intermediate layers / Liu, PC;Hou, CY;Wu, YCS
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