User menu

Accès à distance ? S'identifier sur le proxy UCLouvain

Assessment of advanced SOI technologies for high-temperature applications

Bibliographic reference Alvarado Pulido, José Joaquin ; Kilchytska, Valeriya ; Flandre, Denis. Assessment of advanced SOI technologies for high-temperature applications.8th Edition of the Diagnostics and Yield Symposium (Warsaw (Poland), du 22/06/2009 au 24/06/2009). In: Proceedings of the 8th Edition of the Diagnostics and Yield Symposium, 2009
Permanent URL http://hdl.handle.net/2078.1/90358