Plasticity of electromigration-induced hillocking and its effect on the critical length

Proost, Joris; D'Haen, J.; Maex, K.; Delaey, L.

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Plasticity of electromigration-induced hillocking and its effect on the critical length

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Proost, Joris [UCL] D'Haen, J. [] Maex, K. [] Delaey, L. []

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Document type	Article de périodique (Journal article)
Publication date	2002
Language	Anglais
Journal information	"Journal of Applied Physics" - Vol. 91, no. 11, p. 9108-9115 (2002)
Peer reviewed	yes
issn	0021-8979
Publication status	Publié
Affiliation	UCL -
Links	http://hdl.handle.net/2078/70703[Handle] https://doi.org/10.1063/1.1476080 [DOI]

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Proost Joris, Maex Karen, Delaey Luc, Electromigration threshold in damascene versus plasma-etched interconnects, 10.1063/1.122578
Yavari Parviz, Miller David A, Langdon Terence G, An investigation of harper-dorn creep—I. Mechanical and microstructural characteristics, 10.1016/0001-6160(82)90085-2
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Volin T. E., Balluffi R. W., Annealing kinetics of voids and the Self-diffusion coefficient in aluminum, 10.1002/pssb.19680250116
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Thouless M.D., Effect of surface diffusion on the creep of thin films and sintered arrays of particles, 10.1016/0956-7151(93)90155-l
Proost Joris, Maex Karen, Delacy Luc, Electromigration-induced drift in damascene and plasma-etched Al(Cu). II. Mass transport mechanisms in bamboo interconnects, 10.1063/1.372389

Bibliographic reference	Proost, Joris ; D'Haen, J. ; Maex, K. ; Delaey, L.. Plasticity of electromigration-induced hillocking and its effect on the critical length. In: Journal of Applied Physics, Vol. 91, no. 11, p. 9108-9115 (2002)
Permanent URL	http://hdl.handle.net/2078/70703

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