Journal Article

PreJuSER-36428

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Connection between hydrogen plasma treatment and etching of amorphous phase in the layer-by-layer technique with very high frequency plasma excitation

Vetterl, O.FZJ* ; Hapke, P. ; Houben, L.FZJ* ; Finger, F.FZJ* ; Carius, R. W.FZJ* ; Wagner, H.FZJ*

1999
American Institute of Physics Melville, NY

Please use a persistent id in citations: http://hdl.handle.net/2128/17201

Note: Record converted from VDB: 12.11.2012

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Contributing Institute(s):

1. Institut für Schicht- und Ionentechnik (ISI)

Research Program(s):

1. ohne FE (ohne FE)

Appears in the scientific report 1999

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Database coverage:

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