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Magnetic and junction properties of half-metallic double-perovskite thin films
http://hdl.handle.net/2237/6775
http://hdl.handle.net/2237/6775cb04228c-88c0-478e-9f39-7a6dc5065d48
名前 / ファイル | ライセンス | アクション |
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Item type | 学術雑誌論文 / Journal Article(1) | |||||
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公開日 | 2006-08-01 | |||||
タイトル | ||||||
タイトル | Magnetic and junction properties of half-metallic double-perovskite thin films | |||||
言語 | en | |||||
著者 |
Asano, H.
× Asano, H.× Koduka, N.× Imaeda, K.× Sugiyama, M.× Matsui, M. |
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アクセス権 | ||||||
アクセス権 | open access | |||||
アクセス権URI | http://purl.org/coar/access_right/c_abf2 | |||||
権利 | ||||||
言語 | en | |||||
権利情報 | Copyright © 2005 IEEE. Reprinted from (relevant publication info). This material is posted here with permission of the IEEE. Such permission of the IEEE does not in any way imply IEEE endorsement of any of Nagoya University’s products or services. Internal or personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution must be obtained from the IEEE by writing to pubs-permissions@ieee.org. | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | Double perovskite | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | epitaxial film | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | half-metallic feromagnet | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | magnetic tunnel junction | |||||
抄録 | ||||||
内容記述タイプ | Abstract | |||||
内容記述 | This paper reports the magnetic, electrical, and microstructural properties of epitaxial thin films with an ordered double-perovskite structure. Sr2 FeMoO6 (SFMO) and Sr2 CrReO6 (SCRO) films have been grown by sputtering onto the lattice-matched substrates of Ba0.4 Sr0.6 TiO3 -buffered and bare SrTiO3, respectively. These films exhibit high saturation magnetization Ms values (3.8μB/f.u. for SFMO and 0.9μB/f.u. for SCRO), which are close to the expected values for their half-metallicity, and high curie temperature Tc values (385 K for SFMO and 620 K for SCRO). Surface analyzes by AFM and XPS indicate that these films have atomically flat and well-defined surfaces, which are free from any surface precipitates. This enables us to employ a standard photolithographic process for fabricating magnetic tunnel junctions based on these films. SFMO junctions with a native barrier formed by surface oxidation of a SFMO base-electrode and a Co counterelectrode have shown a tunnel magnetoresistance ratio of 10% at 4.2 K. | |||||
言語 | en | |||||
出版者 | ||||||
出版者 | IEEE | |||||
言語 | en | |||||
言語 | ||||||
言語 | eng | |||||
資源タイプ | ||||||
資源タイプresource | http://purl.org/coar/resource_type/c_6501 | |||||
タイプ | journal article | |||||
出版タイプ | ||||||
出版タイプ | VoR | |||||
出版タイプResource | http://purl.org/coar/version/c_970fb48d4fbd8a85 | |||||
DOI | ||||||
関連タイプ | isVersionOf | |||||
識別子タイプ | DOI | |||||
関連識別子 | https://doi.org/10.1109/TMAG.2005.854836 | |||||
ISSN | ||||||
収録物識別子タイプ | PISSN | |||||
収録物識別子 | 0018-9464 | |||||
書誌情報 |
en : IEEE Transactions on Magnetics 巻 41, 号 10, p. 2811-2813, 発行日 2005-10 |
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フォーマット | ||||||
値 | application/pdf | |||||
著者版フラグ | ||||||
値 | publisher | |||||
URI | ||||||
識別子 | http://hdl.handle.net/2237/6775 | |||||
識別子タイプ | HDL |