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タイトル: Approaching barrier-free contacts to monolayer MoS2 employing [Co/Pt] multilayer electrodes
著者: Gupta, S.
Rortais, F.
Ohshima, R.
Ando, Y.
Endo, T.
Miyata, Y.
Shiraishi, M.
著者名の別形: 大島, 諒
安藤, 裕一郎
遠藤, 尚彦
宮田, 耕充
白石, 誠司
キーワード: Electronic devices
発行日: 5-Feb-2021
出版者: Springer Nature
誌名: NPG Asia Materials
巻: 13
論文番号: 13
抄録: The broken inversion symmetry and time-reversal symmetry along with the large spin–orbit interactions in monolayer MoS2 make it an ideal candidate for novel valleytronic applications. However, the realization of efficient spin-valley-controlled devices demands the integration of perpendicular magnetic anisotropy (PMA) electrodes with negligible Schottky barriers. Here, as the first demonstration, we fabricated a monolayer MoS2 field-effect transistor with PMA electrodes: Pt/[Co/Pt]3 and [Co/Pt]2. The I–V curves of PMA/MoS2 contacts show symmetric and linear behavior reflecting Ohmic nature. The flat-band Schottky barrier heights (SBHs) extracted using the temperature and gate voltage dependence of the I–V curves were found to be 10.2 and 9.6 meV. The observed SBHs are record low values reported thus far for any metal/monolayer MoS2 contact. High-quality PMA electrodes with almost zero SBH play a paramount role in the future development of novel spintronic/valleytronic devices; hence, our results can open a new route toward the realization of novel technological devices employing two-dimensional materials.
記述: 原子膜半導体のスピン機能開拓に前進 --原子膜半導体MoS2中のスピン情報を取り出す際の障壁高さを1/10に低減--. 京都大学プレスリリース. 2021-02-09.
著作権等: © The Author(s) 2021. This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/.
URI: http://hdl.handle.net/2433/261252
DOI(出版社版): 10.1038/s41427-021-00284-1
関連リンク: https://www.kyoto-u.ac.jp/ja/research-news/2021-02-09
出現コレクション:学術雑誌掲載論文等

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