Structure and photoluminescence features of nanocrystalline Si/SiO2 films 
produced by plasma chemical vapor deposition and post-treatment

Wu, X. C.; Ossadnik, C.; Eggs, C.; Veprek, S.; Phillipp, F.

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Structure and photoluminescence features of nanocrystalline Si/SiO₂ films produced by plasma chemical vapor deposition and post-treatment

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Phillipp, F.
Former Dept. Microstructure Interfaces, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Wu, X. C., Ossadnik, C., Eggs, C., Veprek, S., & Phillipp, F. (2002). Structure and photoluminescence features of nanocrystalline Si/SiO₂ films produced by plasma chemical vapor deposition and post-treatment. Journal of Vacuum Science & Technology B, 20(4), 1368-1378.

Cite as: https://hdl.handle.net/11858/00-001M-0000-0010-3089-5

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