Recent progress in nanoparticle photoresist development for EUV lithography

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Kasahara, Kazuki; Kosma, Vasiliki; Odent, Jérémy et al.

2016 • Extreme Ultraviolet (EUV) Lithography VII

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https://hdl.handle.net/20.500.12907/16873

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Disciplines :

Chemistry

Author, co-author :

Kasahara, Kazuki

Kosma, Vasiliki

Xu, Hong

Yu, Mufei

Giannelis, E.P.

Ober, Christopher K.

Language :

English

Title :

Recent progress in nanoparticle photoresist development for EUV lithography

Publication date :

22 February 2016

Event name :

Extreme Ultraviolet (EUV) Lithography VII

Event place :

San Jose, United States

Event date :

2016

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