International Technology Roadmap for Semiconductors (ITRS), Semiconductor Industry Association, (2007). www.itrs.net/Links/2007ITRS/2007-Chapters/2007- Lithography.pdf.
(a) Schift, H. J. Vac. Sci. Technol, B2008,26,458.
(b) Resnick, D. J; Sreenivasan, S. V; Willson, C. G. Mater. Today 2005, 8, 34.
(a) Garcia, R.; Martinez, R. V.; Martinez, J. Chem. Soc. Rev. 2006, 35, 29.
(b) Tseng, A. A.; Notargiacomo, A.; Chen, T. P. J. Vac. Sci. Technol, B 2005, 23,877.
(c) Rolandi, M.; Suez, I.; Scholl, A.; Frechet, J. M. J. Angew. Chem., Int. Ed. 2007, 46, 7477.
(d) Suez, L; Backer, A.; Frechet, J. M. J. Nano Lett. 2005, 5, 321.
(b) Cooper, E. B.; Manalis, S. R.; Fang; Dai, H.; Matsumoto, K.; Minne, S. C.; Hunt, T.; Quate, C. F. Appl. Phys. Lett. 1999, 75, 3566.
Hua, Y.; Saxena, S.; Henderson, C.; King, W. J. Micro/Nanolith., MEMS, MOEMS 2007, 6, 23012.
Gotsmann, B.; Duerig, U.; Frommer, J.; Hawker, C. J. Adv. Func Mat. 2006, 16, 1499.
(a) Ito, H.; Willson, C. G. Photopolymers: Principles, Processes and Materials, Technical Papers of SPE Regional Technical Conference on Photopolymers, November 8-10, 1982, Ellenville, NY, 331.
(b) Ito, H.; Willson, C. G. Polym. Eng. Sci. 1983, 23, 1012.
(c) Tsuda, M.; Hâta, M; Nishida, R; Oikawa, S. J. Polym. Sci., Part A: Polym. Chem. 1997, 55, 77.
(d) Willson, C. G.; Ito, H.; Frechet, J. M. J.; Tessier, T. G.; Houlihan, F. M. J. Eledrochem. Soc. 1986,133, 181.
Guthrie, J. P. J. Am. Chem. Soc. 2000, 122, 5529.
(b) Miura, M. J. Polym. Sci., Part B: Polym. Phys. 1966, 4, 171.
