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Infrared Electronic speckle pattern interferometry at 10 µm
Vandenrijt, Jean-François; Georges, Marc
2007In Osten, W.; Gorecki, C.; Novak, E. (Eds.) Optical Measurement Systems for Industrial Inspection V
Peer reviewed
 

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Keywords :
electronic speckle pattern interferometry; infrared
Abstract :
[en] Demonstration of electronic speckle pattern interferometry of opaque scattering objects at 10 µm wavelength using a commercial thermal-camera is presented for the first time to our knowledge. The idea of using a wavelength longer than the usual visible ones is to render such holographic displacement measurement techniques less sensitive to external perturbations. We have observed the rotation of a metallic plate and applied the phase-shifting technique for quantitative measurements
Disciplines :
Physics
Author, co-author :
Vandenrijt, Jean-François  ;  Université de Liège - ULiège > CSL (Centre Spatial de Liège)
Georges, Marc ;  Université de Liège - ULiège > CSL (Centre Spatial de Liège)
Language :
English
Title :
Infrared Electronic speckle pattern interferometry at 10 µm
Publication date :
June 2007
Event name :
Optical Measurement Systems for Industrial Inspection
Event organizer :
Society of Photo-Optical Instrumentation Engineers
Event place :
Munich, Germany
Event date :
18-21 June 2007
Audience :
International
Main work title :
Optical Measurement Systems for Industrial Inspection V
Editor :
Osten, W.
Gorecki, C.
Novak, E.
Publisher :
Society of Photo-Optical Instrumentation Engineers, Bellingham, WA, United States
ISBN/EAN :
9780819467584
Collection name :
Proceedings of the Society of Photo-Optical Instrumentation Engineers, Vol. 6616
Pages :
66162Q1
Peer reviewed :
Peer reviewed
Available on ORBi :
since 19 January 2010

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